Inorganic polymer photoresist for direct ceramic patterning by photolithography
نویسندگان
چکیده
منابع مشابه
Inorganic polymer photoresist for direct ceramic patterning by photolithography.
A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
متن کاملPhotoresist functionalisation method for high-density protein microarrays using photolithography
Since the last decade, there is a growing need for patterned biomolecules for various applications ranging from diagnostic devices to enabling fundamental biological studies with high throughput. Protein arrays facilitate the study of protein–protein, protein–drug or protein–DNA interactions as well as highly multiplexed immunosensors based on antibody–antigen recognition. Protein microarrays a...
متن کاملMaskless photolithography: Embossed photoresist as its own optical element
This letter demonstrates that features embossed on the surface of a layer of photoresist can direct UV light in the photoresist layer. These topographical features act as optical elements: they focus/ disperse and phase shift incident light in the optical near field, inside the resist layer. A number of different surface topographies have been examined, which give 50–250 nm features after expos...
متن کاملA combined-nanoimprint-and-photolithography patterning technique
We propose a new lithography technique that combines the advantages of nanoimprint lithography (NIL) and photolithography. In this combined-nanoimprint-and-photolithography (CNP) technique, we introduce a hybrid maskmold made from UV transparent material and with a light-blocking metal layer placed on top of the mold protrusions. We demonstrate that the CNP method using such a hybrid mold can a...
متن کاملInvisible Security Printing on Photoresist Polymer Readable by Terahertz Spectroscopy
We experimentally modulate the refractive index and the absorption coefficient of an SU-8 dry film in the terahertz region by UV light (362 nm) exposure with time dependency. Consequently, the refractive index of SU-8 film is increased by approximately 6% after UV light exposure. Moreover, the absorption coefficient also changes significantly. Using the reflective terahertz imaging technique, i...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Chemical Communications
سال: 2007
ISSN: 1359-7345,1364-548X
DOI: 10.1039/b708480c